Question
The functions of an oxide layer in an IC device is to
1. mask against diffusion or ion implant
2. insulate the surface electrically
3. increase the melting point of silicon
4. produce a chemically stable protective layer
Of these statements, which are true.
a.
1, 2, 3
b.
1, 3, 4
c.
2, 3, 4
d.
1, 2, 4
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Q. Consider the following statements. The functions of an oxide layer in an IC device is to 1. mask against diffusion or ion implant 2. insulate the surface electrically 3....
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